Near-field visualization of plasmonic lenses: an overall analysis of characterization errors

• Jing Wang,
• Yongqi Fu,
• Zongwei Xu and
• Fengzhou Fang

Beilstein J. Nanotechnol. 2015, 6, 2069–2077, doi:10.3762/bjnano.6.211

• nanophotonic devices. Keywords: characterization; nanofabrication; near-field; plasmonic lenses; plasmonic structures; Introduction The characteristics of nanophotonic devices that are based on surface plasmon polaritons (SPPs) are appealing because of the extraordinary transmission in free space [1][2][3][4

• [21]. This plasmonic lens has been selected here as a typical example for the purpose of illustrating and analyzing the characterization errors originated from the nanofabrication process of the plasmonic lenses. The focused spot can be tuned by means of tailoring the long and the short axes of the

• intensity profiles of the electric field for plasmonic lenses with different ratios σ under plane wave illumination. The working wavelength of the lenses is 532 nm. Three dimensional (3D) calculations were carried out on the basis of finite-difference and time-domain (FDTD) algorithm. The elliptical ratio